发明名称 EXPOSURE DEVICE
摘要 <p>[Problem] To provide an exposure device that can expose a circuit pattern while altering information data as appropriate. [Solution] The present invention is provided with: a first light source (20) that radiates first light containing ultraviolet rays; a projection exposing unit (70) that exposes a circuit pattern drawn on a photomask onto a substrate using the first light; a substrate stage (60) on which the substrate is placed; a frame (11) which positions the substrate stage; a second light source (41) that radiates second light containing ultraviolet rays and that is disposed differently from the first light source; a spatial light modulation unit (40) that exposes electronically produced information data to the substrate using the second light; and a spatial light modulation unit moving means (50) that moves the spatial light modulation unit disposed at a casing (11) in a direction parallel to the direction of motion of the substrate stage.</p>
申请公布号 WO2012060441(A1) 申请公布日期 2012.05.10
申请号 WO2011JP75435 申请日期 2011.11.04
申请人 ORC MANUFACTURING CO., LTD.;LEE, DUK;TABATA, HIDETOSHI 发明人 LEE, DUK;TABATA, HIDETOSHI
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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