发明名称 CONTACT EXPOSURE METHOD AND DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To prevent the occurrence of an error that displacement is not dissolved no matter how many times positioning is repeated and alignment is not converged in positioning of a mask and a work for contact exposure. <P>SOLUTION: A mask M and a work W are brought into contact, positions of a mask alignment mark MAM and a work alignment mark WAM are detected, and a first alignment amount is obtained. Then, the mask M and the work W are separated, the mask M and the work W are positioned on the basis of the first alignment amount, the mask M and the work W are brought into contact, the positions of a mask mark MAM and a work mark WAM are detected and a second alignment amount is obtained. When the first and second alignment amounts match within a preset range, the second alignment amount is stored as an image shift amount, the mask M and the work W are separated again, the image shift amount is added to the second alignment amount to obtain an alignment amount, and the mask and the work are positioned. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012089723(A) 申请公布日期 2012.05.10
申请号 JP20100236210 申请日期 2010.10.21
申请人 USHIO INC 发明人 OTA NAOKI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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