| 摘要 |
A semiconductor light-emitting device which includes: a single-crystal substrate formed with a plurality of projection portions on a c-plane main surface; an intermediate layer which is formed to cover the main surface of the single-crystal substrate, in which a film thickness t2 on the projection portion is smaller than a film thickness t1 on the c-plane surface, in which the film thickness t2 on the projection portion is 60% or more of the film thickness t1 on the c-plane surface, and which includes AlN having a single-crystal phase on the c-plane surface and a polycrystalline phase on the projection portion; and a semiconductor layer which is formed on the intermediate layer and includes a group III nitride semiconductor.
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