发明名称 Low Cost Metal-Insulator-Metal Capacitors
摘要 A device includes a top metal layer over a substrate; a copper-containing metal feature in the top metal layer; a passivation layer over the top metal layer; and a capacitor. The capacitor includes a bottom electrode including at least a portion in the first passivation layer, wherein the bottom electrode includes aluminum; an insulator over the bottom electrode; and a top electrode over the insulator.
申请公布号 US2012112314(A1) 申请公布日期 2012.05.10
申请号 US20100940523 申请日期 2010.11.05
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 JOU CHEWN-PU;LU TSE-HUA
分类号 H01L29/92 主分类号 H01L29/92
代理机构 代理人
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