The present invention relates to a composition comprising:
(a) a polymer having at least one repeating unit of formula
where R 1 is a non-hydrolysable group and n is an integer ranging from 1 to 3; and (b) a crosslinking catalyst. The composition is useful in forming low k dielectric constant materials and as well as hard mask and underlayer materials with anti-reflective properties for the photolithography industry.
申请公布号
EP2450412(A1)
申请公布日期
2012.05.09
申请号
EP20110195180
申请日期
2008.02.15
申请人
AZ ELECTRONIC MATERIALS USA CORP.
发明人
WU, HENGPENG;KIM, WOO-KYU;ZHUANG, HONG;LU, PINGHUNG;NEISSER, MARK O.;ABDALLAH, DAVID J.;ZHANG, RUZHI