发明名称 WAFER INSPECTION DEVICE AND WAFER INSPECTION SYSTEM HAVING THE SAME
摘要 PURPOSE: A wafer inspection device and a wafer inspection system including the same are provided to maximize accuracy of a wafer inspection process by simultaneously recording a plurality of inspection points using a single inspection camera. CONSTITUTION: A wafer reflector(510a,510b) reflects an image of the upper or lower surface of a wafer boundary in a first direction vertical to a side surface of a wafer. A camera(100) simultaneously records a side surface image of the wafer and an upper or lower surface image of the wafer boundary reflected from the wafer reflector. A displacement device(800) simultaneously transfers the reflector and the camera in a direction parallel to the first direction. A controller controls the displacement device and the camera by determining defects of the wafer boundary through an image recorded from the camera.
申请公布号 KR20120045309(A) 申请公布日期 2012.05.09
申请号 KR20100106769 申请日期 2010.10.29
申请人 HANMISEMICONDUCTOR CO., LTD. 发明人 LIM, JAI YOUNG;JEON, JIN HWAN;YOOM, JEONG SOO
分类号 H01L21/66 主分类号 H01L21/66
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