| 摘要 |
A depression 22 is formed from a first surface 20 of a semiconductor substrate 10 on which is formed an integrated circuit 12. An insulating layer 28 is provided on the inner surface of the depression 22. A first conductive portion 30 is provided on the inside of the insulating layer 28. A second conductive portion 32 is formed on the inside of the insulating layer 28 and over the first conductive portion 30, of a different material from the first conductive portion 30. The first conductive portion 30 is exposed from a second surface 38 of the semiconductor substrate 10 opposite to the first surface 20. <IMAGE> |
