发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
摘要 PURPOSE: A semiconductor device and a method for fabricating the same are provided to have identical resistance by patterning first and second resistor into the same pattern. CONSTITUTION: In a semiconductor device and a method for fabricating the same, a first resistor(R10) is patterned into a zig-zag shape and has a bend part in the side. A second resistor(R11) is patterned into a zig-zag shape and has a bend part in the side. The second resistor has the same shape as the first resistor. The side of the second resistor is bent along the side of the first resistor into the same shape. The first resistor and the second resistor have the same resistance.
申请公布号 KR101143626(B1) 申请公布日期 2012.05.09
申请号 KR20090133243 申请日期 2009.12.29
申请人 发明人
分类号 G11C5/14;H01L21/82 主分类号 G11C5/14
代理机构 代理人
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