发明名称 |
Micropatterning of molecular surfaces via selective irradiation |
摘要 |
A method for surface micropatterning includes forming on a surface containing a first polymer a first coating containing a second polymer having first functionalities capable of being converted to second functionalities by exposure to an acid. A second coating containing a photoacid generator is formed on the first coating. The second coating containing the photoacid generator is selectively irradiated in one or more regions thereof with radiation having a spatially varying internsity pattern to generate an acid in each irradiated region of the second coating. The acid converts the first functionalities of each region of the second polymer underlying a respective irradiated region of the second coating to second functionalities. A first molecular patterned surface having one or more regions of the first functionalities and one or more regions of the second functionalities is formed. |
申请公布号 |
US8173347(B2) |
申请公布日期 |
2012.05.08 |
申请号 |
US20050201915 |
申请日期 |
2005.08.11 |
申请人 |
KOBERSTEIN JEFFREY T.;PAN FENG;LEE KWANGJOO;WANG PENG;THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK |
发明人 |
KOBERSTEIN JEFFREY T.;PAN FENG;LEE KWANGJOO;WANG PENG |
分类号 |
G03F7/00;B05D3/00;G03F7/095;G03F7/16 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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