发明名称 Micropatterning of molecular surfaces via selective irradiation
摘要 A method for surface micropatterning includes forming on a surface containing a first polymer a first coating containing a second polymer having first functionalities capable of being converted to second functionalities by exposure to an acid. A second coating containing a photoacid generator is formed on the first coating. The second coating containing the photoacid generator is selectively irradiated in one or more regions thereof with radiation having a spatially varying internsity pattern to generate an acid in each irradiated region of the second coating. The acid converts the first functionalities of each region of the second polymer underlying a respective irradiated region of the second coating to second functionalities. A first molecular patterned surface having one or more regions of the first functionalities and one or more regions of the second functionalities is formed.
申请公布号 US8173347(B2) 申请公布日期 2012.05.08
申请号 US20050201915 申请日期 2005.08.11
申请人 KOBERSTEIN JEFFREY T.;PAN FENG;LEE KWANGJOO;WANG PENG;THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK 发明人 KOBERSTEIN JEFFREY T.;PAN FENG;LEE KWANGJOO;WANG PENG
分类号 G03F7/00;B05D3/00;G03F7/095;G03F7/16 主分类号 G03F7/00
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