发明名称 METHODS AND APPARATUS FOR INSITU ANALYSIS OF GASES IN ELECTRONIC DEVICE FABRICATION SYSTEMS
摘要 <p>Systems and methods are disclosed that include adjusting a pressure level of a sample gas in a testing chamber, for example, using a pressurized inert reference gas, and determining a composition of the adjusted sample gas. By adjusting the pressure level of the sample gas, the composition of the sample gas may be determined more accurately than otherwise possible. Numerous other aspects are disclosed.</p>
申请公布号 KR101143080(B1) 申请公布日期 2012.05.08
申请号 KR20097003515 申请日期 2007.07.30
申请人 发明人
分类号 G01N7/14;G01N1/22;G01N1/38 主分类号 G01N7/14
代理机构 代理人
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