发明名称 |
Exposure apparatus and method for producing device |
摘要 |
A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liquid to a space between the projection system and the substrate table, and a cleaning system which cleans the substrate table.
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申请公布号 |
US8174668(B2) |
申请公布日期 |
2012.05.08 |
申请号 |
US20070767425 |
申请日期 |
2007.06.22 |
申请人 |
KOBAYASHI NAOYUKI;TANIMOTO AKIKAZU;MIZUNO YASUSHI;SHIRAISHI KENICHI;NAKANO KATSUSHI;OWA SOICHI;NIKON CORPORATION |
发明人 |
KOBAYASHI NAOYUKI;TANIMOTO AKIKAZU;MIZUNO YASUSHI;SHIRAISHI KENICHI;NAKANO KATSUSHI;OWA SOICHI |
分类号 |
G03B27/52;G03B27/42;G03F7/20 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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