发明名称 |
Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the same |
摘要 |
An etchant composition that allows simplification and optimization of semiconductor manufacturing process is presented, along with a method of patterning a conductive layer using the etchant and a method of manufacturing a flat panel display using the etchant. The etchant includes nitric acid, phosphoric acid, acetic acid, and an acetate compound in addition to water. |
申请公布号 |
US8173546(B2) |
申请公布日期 |
2012.05.08 |
申请号 |
US201113167587 |
申请日期 |
2011.06.23 |
申请人 |
KIM BONG-KYUN;PARK HONG-SICK;CHOUNG JONG-HYUN;HONG SUN-YOUNG;LEE JI-SUN;LEE BYEONG-JIN;BAEK KUI-JONG;RHEE TAI-HYUNG;SONG YONG-SUNG;SAMSUNG ELECTRONICS CO., LTD.;TECHNO SEMICHEM CO., LTD. |
发明人 |
KIM BONG-KYUN;PARK HONG-SICK;CHOUNG JONG-HYUN;HONG SUN-YOUNG;LEE JI-SUN;LEE BYEONG-JIN;BAEK KUI-JONG;RHEE TAI-HYUNG;SONG YONG-SUNG |
分类号 |
H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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