发明名称 |
Extreme ultraviolet light source apparatus |
摘要 |
An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.
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申请公布号 |
US8173984(B2) |
申请公布日期 |
2012.05.08 |
申请号 |
US20090382964 |
申请日期 |
2009.03.27 |
申请人 |
MORIYA MASATO;ABE TAMOTSU;SUGANUMA TAKASHI;SOMEYA HIROSHI;YABU TAKAYUKI;SUMITANI AKIRA;WAKABAYASHI OSAMU;KOMATSU LTD.;GIGAPHOTON INC. |
发明人 |
MORIYA MASATO;ABE TAMOTSU;SUGANUMA TAKASHI;SOMEYA HIROSHI;YABU TAKAYUKI;SUMITANI AKIRA;WAKABAYASHI OSAMU |
分类号 |
A61N5/06;G01J3/10;H05G2/00 |
主分类号 |
A61N5/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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