发明名称 Dummy pattern in wafer backside routing
摘要 A device includes a semiconductor substrate including a front side and a backside. A through-substrate via (TSV) penetrates the semiconductor substrate. A dummy metal line is formed on the backside of the semiconductor substrate, and may be connected to the dummy TSV.
申请公布号 US8174124(B2) 申请公布日期 2012.05.08
申请号 US20100756727 申请日期 2010.04.08
申请人 CHIU MING-YEN;CHEN HSIEN-WEI;CHEN MING-FA;JENG SHIN-PUU;TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHIU MING-YEN;CHEN HSIEN-WEI;CHEN MING-FA;JENG SHIN-PUU
分类号 H01L23/48 主分类号 H01L23/48
代理机构 代理人
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