发明名称 |
Illumination optical system for microlithography |
摘要 |
The disclosure provides an illumination optical system for microlithography that is designed so that, even with a change of illumination setting (e.g., a change in the given illumination conditions in the object field), variation of illumination parameters over the object field is confined within predetermined tolerances. |
申请公布号 |
US8174677(B2) |
申请公布日期 |
2012.05.08 |
申请号 |
US20080233914 |
申请日期 |
2008.09.19 |
申请人 |
OSSMANN JENS;ENDRES MARTIN;STUETZLE RALF;CARL ZEISS SMT GMBH |
发明人 |
OSSMANN JENS;ENDRES MARTIN;STUETZLE RALF |
分类号 |
G03B27/54;G02B5/08;G03B27/70 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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