发明名称 |
Photosensitive resin composition |
摘要 |
The present invention relates to a photosensitive resin composition, particularly to a photosensitive resin composition for forming an interlayer organic insulating film for TFT-LCD, comprising 0.01 to 20 wt % of UV stabilizer or radical scavenger. The photosensitive resin composition of the present invention can be used for forming an interlayer organic insulating film for TFT-LCD to improve active unfilled area upon over exposure in liquid crystal photo-alignment process, can easily control resolution of pattern, and is particularly suitable for forming a planarization layer of an interlayer organic insulating film. |
申请公布号 |
US8173729(B2) |
申请公布日期 |
2012.05.08 |
申请号 |
US20100714837 |
申请日期 |
2010.03.01 |
申请人 |
YOUN HYOC-MIN;KIM BYUNG-UK;KOO KI-HYUK;YEO TAE-HOON;YUN JOO-PYO;SHIN HONG-DAE;LEE SANG HOON;KIM DONG-MYUNG;CHOI SU-YOUN;KIM JIN SUN;WOO CHANG-MIN;KIM HONG-SUK;DONGJIN SEMICHEM CO., LTD. |
发明人 |
YOUN HYOC-MIN;KIM BYUNG-UK;KOO KI-HYUK;YEO TAE-HOON;YUN JOO-PYO;SHIN HONG-DAE;LEE SANG HOON;KIM DONG-MYUNG;CHOI SU-YOUN;KIM JIN SUN;WOO CHANG-MIN;KIM HONG-SUK |
分类号 |
C08K5/3447;C08K5/3435;C08K5/3492 |
主分类号 |
C08K5/3447 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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