| 摘要 |
<p>A photoresist composition includes a novolac resin having where each of R1, R2, R3, and R4 is an alkyl group having a hydrogen atom or between one through six carbon atoms and n is an integer ranging from zero through three; and a mercapto compound having <?in-line-formulae description="In-line Formulae" end="lead"?>Z1-SH, or<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>SH-Z2-SH,<?in-line-formulae description="In-line Formulae" end="tail"?> where each of Z1 and Z2 is an alkyl group or an alkyl group having one through twenty carbon atoms, a sensitizer, and a solvent.</p> |
