发明名称 Method and device for producing semiconductor wafers of silicon
摘要 Semiconductor wafers of silicon are produced by pulling a single crystal from a melt contained in a crucible and slicing semiconductor wafers from the pulled single crystal, heat being delivered to a center of the growing single crystal at the boundary with the melt during the pulling of the single crystal, a CUSP magnetic field applied such that a neutral surface of the CUSP magnetic field intersects a pulling axis of the single crystal at a distance of at least 50 mm from a surface of the melt. An apparatus suitable therefore contains a CUSP field positioned such that a neutral field intersects the axis of the crystal in the crucible 50 mm or more from the melt surface.
申请公布号 US8172941(B2) 申请公布日期 2012.05.08
申请号 US20070002881 申请日期 2007.12.19
申请人 WEBER MARTIN;SCHMIDT HERBERT;VON AMMON WILFRIED;SILTRONIC AG 发明人 WEBER MARTIN;SCHMIDT HERBERT;VON AMMON WILFRIED
分类号 C30B15/00;C30B21/06;C30B27/02;C30B28/10;C30B30/04 主分类号 C30B15/00
代理机构 代理人
主权项
地址