发明名称 |
Method of forming pattern and composition for forming of organic thin-film for use therein |
摘要 |
A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate; (2) a step of irradiating the underlayer film with radiation rays through a mask with a predetermined pattern to obtain an exposed underlayer film portion having been selectively exposed through the predetermined pattern; (3) a step of forming (C) an organic thin film on the underlayer film so as to attain chemical bonding of the exposed underlayer film portion with the organic thin-film formed on the exposed underlayer film portion; and (4) a step of removing the organic thin film formed on areas of the underlayer film other than the exposed underlayer film portion. |
申请公布号 |
US8173348(B2) |
申请公布日期 |
2012.05.08 |
申请号 |
US20070305893 |
申请日期 |
2007.06.21 |
申请人 |
SHIMIZU DAISUKE;SUGITA HIKARU;MATSUMURA NOBUJI;KAI TOSHIYUKI;SHIMOKAWA TSUTOMU;JSR CORPORATION |
发明人 |
SHIMIZU DAISUKE;SUGITA HIKARU;MATSUMURA NOBUJI;KAI TOSHIYUKI;SHIMOKAWA TSUTOMU |
分类号 |
G03F7/00;G03F7/004;G03F7/075;G03F7/40 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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