发明名称 Floating-gate structure with dielectric component
摘要 Floating-gate memory cells having a floating gate with a conductive portion and a dielectric portion facilitate increased levels of charge trapping sites within the floating gate. The conductive portion includes a continuous component providing bulk conductivity to the floating gate. The dielectric portion is discontinuous within the conductive portion and may include islands of dielectric material and/or one or more contiguous layers of dielectric material having discontinuities.
申请公布号 US8174061(B2) 申请公布日期 2012.05.08
申请号 US20090364809 申请日期 2009.02.03
申请人 MOULI CHANDRA;SANDHU GURTEJ S.;MICRON TECHNOLOGY, INC. 发明人 MOULI CHANDRA;SANDHU GURTEJ S.
分类号 H01L29/788 主分类号 H01L29/788
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