发明名称 Method of manufacturing a light emitting diode element
摘要 A method of manufacturing a light emitting diode element is provided. A first patterned semi-conductor layer, a patterned light emitting layer, and a second patterned semi-conductor layer are sequentially formed on an epitaxy substrate so as to form a plurality of epitaxy structures, wherein the first patterned semi-conductor layer has a thinner portion in a non-epitaxy area outside the epitaxy structures. A passivation layer covering the epitaxy structures and the thinner portion is formed. The passivation layer covering on the thinner portion is partially removed to form a patterned passivation layer. A patterned reflector is formed directly on each of the epitaxy structures. The epitaxy structures are bonded to a carrier substrate. A lift-off process is performed to separate the epitaxy structures from the epitaxy substrate. An electrode is formed on each of the epitaxy structures far from the patterned reflector.
申请公布号 US8173456(B2) 申请公布日期 2012.05.08
申请号 US20090648308 申请日期 2009.12.29
申请人 TSAY JENQ-DAR;LIN SUH-FANG;CHANG YU-HSIANG;GUO YIH-DER;KUO SHENG-HUEI;KUO WEI-HUNG;LIU HSUN-CHIH;INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 TSAY JENQ-DAR;LIN SUH-FANG;CHANG YU-HSIANG;GUO YIH-DER;KUO SHENG-HUEI;KUO WEI-HUNG;LIU HSUN-CHIH
分类号 H01L21/00 主分类号 H01L21/00
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