发明名称 Methods of utilizing block copolymer to form patterns
摘要 Some embodiments include methods of utilizing block copolymer to form patterns between weirs. The methods may utilize liners along surfaces of the weirs to compensate for partial-width segments of the patterns in regions adjacent the weirs. Some embodiments include methods in which spaced apart structures are formed over a substrate, and outer surfaces of the structures are coated with a thickness of coating. Diblock copolymer is used to form a pattern across spaces between the structures. The diblock copolymer includes a pair of block constituents that have different affinities for the coating relative to one another. The pattern includes alternating segments, with the segments adjacent to the coating being shorter than the segments that are not adjacent to the coating. The coating thickness is about the amount by which the segments adjacent to the coating are shorter than the segments that are not adjacent to the coating.
申请公布号 US8173034(B2) 申请公布日期 2012.05.08
申请号 US20080272517 申请日期 2008.11.17
申请人 MILLWARD DAN;KRAMER STEPHEN J.;SANDHU GURTEJ S.;MICRON TECHNOLOGY, INC. 发明人 MILLWARD DAN;KRAMER STEPHEN J.;SANDHU GURTEJ S.
分类号 C03C15/00;B44C1/22;C03C25/68;C23F1/00 主分类号 C03C15/00
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