发明名称 |
COATING APPARATUS AND METHOD OF FORMING COATING LAYER USING THE SAME |
摘要 |
PURPOSE: A coating apparatus and a coating film forming method using the same are provided to prevent the occurrence of coating defects due to the thickness difference of photoresist. CONSTITUTION: A coating apparatus includes a nozzle part(125), a moving shaft(110), a rotary connecting member(112), a stage(140), and a washing unit(162). The nozzle part is composed of a nozzle tip(122) and a head(120). The nozzle tip sprays coating liquid, and the head stores the coating liquid. The moving shaft linearly moves the nozzle part. The rotary connecting member connects the moving shaft and the nozzle part and rotates the nozzle part. The stage is arranged at the lower side of the moving shaft. The nozzle part is fixed to the perpendicular direction of the surface of the stage. |
申请公布号 |
KR20120044193(A) |
申请公布日期 |
2012.05.07 |
申请号 |
KR20100105626 |
申请日期 |
2010.10.27 |
申请人 |
LG DISPLAY CO., LTD. |
发明人 |
JEONG, TAE KYUN;JEONG, KYONG DEUK;PARK, JONG IK;KIM, MYUNG SHIK;KIM, HYOUNG WON;SHIN, DONG KI;CHOI, JEONG HAK |
分类号 |
B05C5/00;B05C9/00;G02F1/13 |
主分类号 |
B05C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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