发明名称 PROCEDE DE FABRICATION D'UN MATERIAU POREUX EN DIAMANT DE SYNTHESE
摘要 <p>A method of manufacturing a diamond layer having a porous three-dimensional structure, the method being of the type which includes growing the diamond layer from a sacrificial material and gradually decomposing said sacrificial material during growth of the diamond layer, said material including the following steps; 1) provision of a substrate capable of supporting the plasma-enhanced chemical vapour deposition growth of the diamond layer on at least one of the surfaces of of the substrate, the substrate comprising, on said at least one surface thereof, a layer made of a sacrificial material having a porous three-dimensional structure capable of gradually decomposing upon contact with said plasma, the layer of sacrificial material containing diamond grains of nanometric size, and 2) growth by plasma-enhanced chemical vapour deposition of the diamond layer from diamond grains and concomitant and gradual decomposition of the scrificial material upon contact with said plasma.</p>
申请公布号 FR2958640(B1) 申请公布日期 2012.05.04
申请号 FR20100052613 申请日期 2010.04.07
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES 发明人 SCORSONE EMMANUEL;GIRARD HUGUES
分类号 C01B31/06;C23C16/27 主分类号 C01B31/06
代理机构 代理人
主权项
地址