发明名称 RESIST STRUCTURE FOR PRODUCING AN X-RAY OPTICAL GRATING STRUCTURE
摘要 The invention relates to a resist structure for producing an X-ray optical grating structure. The invention comprises stabilizing bars (3) which are introduced into the resist structure. The webs (1) of the resist structure are applied to a substrate (2) at a first angle alpha, and the stabilizing bars at a second angle beta, wherein, between alpha and beta, there is preferably at least a spacing of 20° and at most a spacing of 70°, in order to obtain the best possible stabilizing action. In particular, the production of X-ray optical grating structures having aspect ratios of more than 500 is made possible without the grating structures bending or the stabilizing structure having a detrimental effect on the visibility. The resist structures are suitable in particular for producing X-ray optical grating structures from gold.
申请公布号 WO2012055495(A1) 申请公布日期 2012.05.03
申请号 WO2011EP05141 申请日期 2011.10.13
申请人 KARLSRUHER INSTITUT FUER TECHNOLOGIE;MOHR, JUERGEN;LAST, ARNDT;NAZMOV, VLADIMIR;SIMON, MARKUS;GRUND, THOMAS;KENNTNER, JOHANNES 发明人 MOHR, JUERGEN;LAST, ARNDT;NAZMOV, VLADIMIR;SIMON, MARKUS;GRUND, THOMAS;KENNTNER, JOHANNES
分类号 G21K1/06 主分类号 G21K1/06
代理机构 代理人
主权项
地址