发明名称 SEAL RING STRUCTURE WITH POLYIMIDE LAYER ADHESION
摘要 The present disclosure provides a semiconductor device, including a substrate having a seal ring region and a circuit region, a seal ring structure disposed over the seal ring region, a first passivation layer disposed over the seal ring structure, the first passivation layer having a first passivation layer aperture over the seal ring structure, and a metal pad disposed over the first passivation layer, the metal pad coupled to the seal ring structure through the first passivation layer aperture and having a metal pad aperture above the first passivation layer aperture. The device further includes a second passivation layer disposed over the metal pad, the second passivation layer having a second passivation layer aperture above the metal pad aperture, and a polyimide layer disposed over the second passivation layer, the polyimide layer filling the second passivation layer aperture to form a polyimide root at an exterior tapered edge of the polyimide layer.
申请公布号 US2012104541(A1) 申请公布日期 2012.05.03
申请号 US20100938680 申请日期 2010.11.03
申请人 CHIU TZU-WEI;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 CHIU TZU-WEI
分类号 H01L27/04;H01L21/28 主分类号 H01L27/04
代理机构 代理人
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