| 摘要 |
PURPOSE: A layer forming apparatus is provided to improve the use efficiency of the device by setting a longer maintenance period of a chamber and increase the progressing efficiency of epitaxial-growth in a high-temperature environment. CONSTITUTION: A layer forming apparatus comprises a load lock chamber(500), a transfer chamber(100), a reaction chamber(310), a process separation reaction chamber(200), and a gas distributor. In the transfer chamber, a transfer robot for transferring a substrate from the load rock chamber. The reaction chamber is provided with the substrate from the transfer robot and makes one or more epitaxial layers grow on the substrate. The process separation reaction chamber is provided with the substrate with the epitaxial layers from the transfer robot of the transfer chamber and forms one or more different epitaxial layers on the epitaxial layer of the substrate. The gas distributor supplies processing gas to the reaction chamber and the process separation reaction chamber.
|
