发明名称 |
SYSTEM FOR LASER DIRECT WRITING OF MESA STRUCTURES HAVING NEGATIVELY SLOPED SIDEWALLS |
摘要 |
The general field of the invention is that of photolithography systems intended for producing electronic components, using the lift-off technique, on a flat substrate (1) comprising one or more flat photosensitive layers. The system according to the invention is a laser direct-write system. It comprises optical or mechanical means arranged so that the useful part of the optical beam (F) is inclined in the plane of the photosensitive layers in order to create re-entrant profiles in said layers, the useful part of the optical beam being the part of the optical beam that actually contributes to create said profiles. In a preferred embodiment of the invention, the system comprises means (50) for partially blocking the optical beam, said means being located in the vicinity of the focusing optics (23). |
申请公布号 |
WO2012055725(A1) |
申请公布日期 |
2012.05.03 |
申请号 |
WO2011EP68168 |
申请日期 |
2011.10.18 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES;DELLEA, OLIVIER;FUGIER, PASCAL;TEBBY, ZOE |
发明人 |
DELLEA, OLIVIER;FUGIER, PASCAL;TEBBY, ZOE |
分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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