| 摘要 |
The present invention relates to a pulsed laser deposition apparatus, comprising: a laser beam generating unit which generates a laser beam; a deposition object; a vacuum chamber, in which a plurality of types of deposition target materials to be deposited on the deposition object is arranged; a beam splitter which splits the laser beam generated by the laser beam generating unit into a plurality of laser beams corresponding to the deposition target materials; and lens units which are arranged to correspond to the respective deposition target materials, and which focus the laser beams, which are applied by being split by the beam splitter, onto the respective deposition target materials. As described above, the pulsed laser deposition apparatus and the deposition method using same involve arranging the plurality of types of deposition target materials in the vacuum chamber, splitting the laser beam generated by the laser beam generating unit into the number of beams corresponding to the number of the deposition target materials by means of a beam splitter, and focusing the laser beams onto the respective deposition target materials in such a manner that the outputs of the laser beams vary by means of variable attenuators as time elapses. |
