Chemical Vapor Deposition Apparatus and Cooling Block Thereof

摘要

The present invention provides a chemical vapor deposition apparatus and a cooling block thereof. The chemical vapor deposition apparatus comprises a process chamber; at least one clean gas channel connected between the process chamber and a remote plasma source; and an anti-fluoride material layer formed in the clean gas channel. The clean gas channel can be formed in a block body of the cooling block. The present invention can enhance the cleaniness of the process chamber.