发明名称 MULTI-AGENT TYPE CLEANING KIT FOR SEMICONDUCTOR SUBSTRATES, CLEANING METHOD USING THE SAME AND METHOD OF PRODUCING SEMICONDUCTOR ELEMENT
摘要 A multi-agent type cleaning kit for applying to semiconductor substrates, which contains a foaming agent having an alkylene carbonate and a carbonic acid salt, a foaming aid having an acidic compound, and an oxidizing agent; at least the foaming agent is mixed with the foaming aid upon using for the cleaning of a semiconductor substrate, in combination with the oxidizing agent.
申请公布号 US2012108485(A1) 申请公布日期 2012.05.03
申请号 US201113281885 申请日期 2011.10.26
申请人 KAMIMURA TETSUYA;FUJIFILM CORPORATION 发明人 KAMIMURA TETSUYA
分类号 G03F7/42 主分类号 G03F7/42
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