发明名称 METHODS FOR CALIBRATING RF POWER APPLIED TO A PLURALITY OF RF COILS IN A PLASMA PROCESSING SYSTEM
摘要 Methods for calibrating RF power applied to a plurality of RF coils are provided. In some embodiments, a method of calibrating RF power applied to a first and second RF coil of a process chamber having a power divider to control a first ratio equal to a first magnitude of RF power provided to the first RF coil divided by a second magnitude of RF power provided to the second RF coil, may include measuring a plurality of first ratios over a range of setpoint values of the power divider, comparing the plurality of measured first ratios to a plurality of reference first ratios, and adjusting an actual value of the power divider at a given setpoint value such that the first ratio of the power divider at the given setpoint matches the corresponding reference first ratio to within a first tolerance level.
申请公布号 US2012104950(A1) 申请公布日期 2012.05.03
申请号 US201113090916 申请日期 2011.04.20
申请人 APPLIED MATERIALS, INC. 发明人 BANNA SAMER;TODOROW VALENTIN N.;WANG TSE-CHIANG;LIN XING
分类号 H05B31/26 主分类号 H05B31/26
代理机构 代理人
主权项
地址