发明名称 POLISHING PAD AND METHOD FOR PRODUCING SAME
摘要 <p>The purpose of the present invention is to provide: a polishing pad that improves dressing properties, and with which the surface of an object to be polished is not easily scratched; and a method for producing the polishing pad. This polishing pad has an abrasive layer comprising non-foamed polyurethane. The non-foamed polyurethane is a reaction-hardened body of a polyurethane raw material composition containing: an isocyanate-terminated prepolymer (A) obtained by reacting a prepolymer (A) raw material composition containing a diisocyanate, a high-molecular-weight polyol (a) and a low-molecular-weight polyol; an isocyanate-modified body polymerized by adding at least 3 diisocyanates; an isocyanate-terminated prepolymer (B) obtained by reacting a prepolymer (B) raw material composition containing a high-molecular-weight polyol (b); and a chain extender. The polishing pad is characterized in that the added quantity of the isocyanate-terminated prepolymer (B) is 5 to 30 parts by weight with respect to 100 parts by weight of the isocyanate-terminated prepolymer (A).</p>
申请公布号 WO2012056513(A1) 申请公布日期 2012.05.03
申请号 WO2010JP68911 申请日期 2010.10.26
申请人 TOYO TIRE & RUBBER CO.,LTD.;NAKAI,YOSHIYUKI;OGAWA,KAZUYUKI;NAKAMURA,KENJI 发明人 NAKAI,YOSHIYUKI;OGAWA,KAZUYUKI;NAKAMURA,KENJI
分类号 B24B37/00;B28D5/04;H01L21/304 主分类号 B24B37/00
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