发明名称 |
METHOD FOR CLEANING FILM FORMING APPARATUS, FILM FORMING METHOD, AND FILM FORMING APPARATUS |
摘要 |
<p>Plasma is generated between a cathode electrode (11) and an anode electrode (12) under a first condition. After that, plasma is generated under a second condition that is different from the first condition. Under the second condition, the plasma spreads further outwardly between the cathode electrode (11) and the anode electrode (12) in comparison to the case under the first condition. As a result, materials adhering to the members provided in the vicinity of the outer peripheries of the electrodes can be quickly removed in addition to materials adhering to the electrodes.</p> |
申请公布号 |
WO2011071069(A9) |
申请公布日期 |
2012.05.03 |
申请号 |
WO2010JP71995 |
申请日期 |
2010.12.08 |
申请人 |
SHARP KABUSHIKI KAISHA;KISHIMOTO, KATSUSHI;ISSHIKI, KAZUHIKO |
发明人 |
KISHIMOTO, KATSUSHI;ISSHIKI, KAZUHIKO |
分类号 |
H01L21/205;C23C16/44;C23C16/503 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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