| 摘要 |
<p>Provided is a configuration in a film forming device which carries out a cat-CVD method wherein problems caused by deformation of a catalyst are alleviated and which is superior in terms of running costs and productivity. The film forming device comprises: a processing chamber capable of maintaining a decompression state internally; a gas introduction path (3) which introduces a prescribed source gas into the processing chamber; catalysts (41) which are disposed within the processing chamber such that the source gas introduced by the gas introduction path (3) either makes contact with the surface thereof or passes close to said surface; a power supply (5) which applies energy to the catalysts (41) and heats the catalysts (41); a metallic plate (6) which is disposed below the catalysts (41); and a control device (8) which detects either a current flowing through the metallic plate (6) or a voltage of the metallic plate (6), and determines a state of contact between the catalysts (41) and the metallic plate (6).</p> |
