发明名称 GRAPHENE TRANSPARENT ELECTODE AND FLEXIBLE SILICON THIN FILM SEMICONDUCTOR DEVICE HAVING THE SAME
摘要 <p>PURPOSE: A graphene transparent electrode and a flexible silicon thin film semiconductor device including thereof are provided to enhance electrical, optical, and mechanical properties of the graphene film. CONSTITUTION: A graphene transparent electrode includes a graphene film. The graphene film is provided as a conductive layer. A transparent electrode is flexible. The graphene film is formed on a transparent substrate. A thickness of the graphene film is 0.1 nano meter-10 nano meters. A surface resistance of the transparent electrode is 1-1000Ω/sq. A permeability of the transparent electrode is 70% or greater. The grapheme film is manufactured by providing carbon source and heat to transition metal catalyst layer for growth of the graphene and translating the grew graphene film by using a chemical gaseity deposition method.</p>
申请公布号 KR20120042777(A) 申请公布日期 2012.05.03
申请号 KR20120013357 申请日期 2012.02.09
申请人 SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION 发明人 AHN, JONG HYUN;HONG, BYUNG HEE;JANG, HO UK;JANG, SUK JAE;KOO, JAE BON
分类号 B41M5/03;G02F1/1343;H01B5/14;H01L29/786 主分类号 B41M5/03
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