| 摘要 |
<p>In the case of measuring a pattern having a large process fluctuation, correct measurement has not been performed when noises, such as a pattern that is not a subject to be measured, and dirt, are present at the periphery of the pattern to be measured in a previously registered measuring region. The present invention sets a predetermined region aligned by pattern matching, among the image data of a sample, as a region not to be measured, i.e., a region to be excluded from the subjects to be pattern-measured. For instance, in the case of measuring a pattern having a large process fluctuation, merely a region including a pattern having a small process fluctuation is used in pattern matching, and in pattern measurement, a predetermined region, which has been used in the pattern matching and has been aligned, is set as the region not to be measured. Stable pattern measurement can be easily performed with respect to the pattern having a large process fluctuation, without being affected by a region where the region to be measured and the region not to be measured overlap each other.</p> |
