发明名称 Hydrogen chloride gaz ejecting nozzle, reaction apparatus for producing thrichlorosilane and method for producing trichlorosilane
摘要 <p>There is provided a hydrogen chrolide gas ejecting nozzle 1 used in a reaction apparatus for producing trichlorosilane in which metal silicon powder is reacted with hydrogen chloride gas to generate trichlorosilane. The member is provided with a shaft portion extending in the longitudinal direction and a head portion that is provided on an end of the shaft portion and extends in a direction intersecting the longitudinal direction of the shaft portion. A supply hole extending in the longitudinal direction is formed in the shaft portion, a plurality of ejection holes are formed in the head portion, and each of the ejection holes is communicatively connected to the supply hole and opened on the outer surface of the head portion toward a direction intersecting the direction to which the supply hole extends.</p>
申请公布号 EP2055375(B1) 申请公布日期 2012.05.02
申请号 EP20080167142 申请日期 2008.10.21
申请人 MITSUBISHI MATERIALS CORPORATION 发明人 INABA, CHIKARA
分类号 B01J19/26;C01B33/107 主分类号 B01J19/26
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