| 摘要 |
The invention relates to a lithographic apparatus including a support frame (SF) which is supported by a base (BA) via a vibration isolation system; a projection system (PS) arranged to transfer a pattern from a patterning device onto a substrate, wherein the projection system includes a first frame (1F) which is spring-supported by the support frame; and an active damping system configured to damp movement of the first frame, including: a first sensor system (SE1) configured to provide a first sensor output representative of absolute movement of the first frame, a first actuator system (AC1) arranged to apply a force between the first frame and the support frame, and a control system (CS) configured to provide a drive signal to the first actuator system based on the first sensor output. |
