发明名称 Semiconductor device manufacturing method having a step of applying a copper foil on a substrate as a part of a wiring connecting an electrode pad to a mounting terminal
摘要 <p>A method of manufacturing a semiconductor device (10A, 10B, 10C) is provided. The method comprises a wire-forming step of forming a wiring (12A, 12B, 12C, 12D) on a substrate (40) having an electrode pad (15) so as to connect the electrode pad to a mounting terminal (14). The wire-forming step includes the steps of: applying a metal foil (25) to the substrate by providing an adhesive (18) therebetween; patterning the metal foil into a predetermined pattern so as to form the wiring; and connecting the wiring to the electrode pad electrically. <IMAGE></p>
申请公布号 EP2261970(A3) 申请公布日期 2012.05.02
申请号 EP20100180097 申请日期 2001.06.05
申请人 FUJITSU SEMICONDUCTOR LIMITED 发明人 AIBA, YOSHITAKA;SATO, MITSUTAKA
分类号 H01L23/485;H01L23/52;H01L21/3205;H01L21/60;H01L23/12;H01L23/31;H01L23/48 主分类号 H01L23/485
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