发明名称 Plasma, UV and ion/neutral assisted ALD or CVD in a batch tool
摘要 A batch processing chamber includes a chamber housing, a substrate boat for containing a batch of substrates in a process region, and an excitation assembly for exciting species of a processing gas. The excitation assembly is positioned within the chamber housing and may include plasma, UV, or ion assistance.
申请公布号 US8168269(B2) 申请公布日期 2012.05.01
申请号 US20100883889 申请日期 2010.09.16
申请人 MAHAJANI MAHREEYEE;YUDOVSKY JOSEPH;MCDOUGALL BRENDON;APPLIED MATERIALS, INC. 发明人 MAHAJANI MAHREEYEE;YUDOVSKY JOSEPH;MCDOUGALL BRENDON
分类号 H05H1/24;C23C16/00 主分类号 H05H1/24
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