发明名称 |
Charge trapping memory cell having bandgap engineered tunneling structure with oxynitride isolation layer |
摘要 |
A band gap engineered, charge trapping memory cell includes a charge storage structure including a trapping layer. a blocking layer, and a dielectric tunneling structure including a thin tunneling layer, a thin bandgap offset layer and a thin isolation layer comprising silicon oxynitride. The memory cell is manufactured using low thermal budget processes. |
申请公布号 |
US8169835(B2) |
申请公布日期 |
2012.05.01 |
申请号 |
US20090568272 |
申请日期 |
2009.09.28 |
申请人 |
LIAO JENG-HWA;SHIEH JUNG-YU;YANG LING-WUU;MACRONIX INTERNATIONAL CO., LTD. |
发明人 |
LIAO JENG-HWA;SHIEH JUNG-YU;YANG LING-WUU |
分类号 |
G11C16/04 |
主分类号 |
G11C16/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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