发明名称 Drying furnace for coated film
摘要 In drying of a glass substrate to which a coated film is applied, the heating and drying is conducted while feeding means 10, 18, which always moves on a lower surface of the glass substrate 6 to which the coated film is applied, abuts against the substrate, in order to solve a problem that when the lower surface of the coated film is supported for a long time, supporting traces occur and thereby quality of the glass substrate is reduced. With this configuration, traces of the pin 11, 12, 21 are less likely to occur.
申请公布号 US8167611(B2) 申请公布日期 2012.05.01
申请号 US20050659317 申请日期 2005.08.22
申请人 NAKANO TERUYUKI;KOZAWA YASUHIRO;KABUSHIKI KAISHA ISHIIHYOKI 发明人 NAKANO TERUYUKI;KOZAWA YASUHIRO
分类号 F27D3/06 主分类号 F27D3/06
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