发明名称 Method for manufacturing group III nitride compound semiconductor light-emitting device, group III nitride compound semiconductor light-emitting device, and lamp
摘要 A method for manufacturing a Group III nitride semiconductor light-emitting device according to the present invention, comprising forming, on a substrate, a semiconductor layer comprised of a Group III nitride compound semiconductor containing Ga as a Group III element by a sputtering method, wherein during the formation of the semiconductor layer, sputtering is performed under the condition where at least the surface layer of a sputtering target comprised of Ga is liquefied.
申请公布号 US8168460(B2) 申请公布日期 2012.05.01
申请号 US20070519987 申请日期 2007.12.18
申请人 MIKI HISAYUKI;HANAWA KENZO;SASAKI YASUMASA;SHOWA DENKO K.K. 发明人 MIKI HISAYUKI;HANAWA KENZO;SASAKI YASUMASA
分类号 H01L21/20;H01L33/06;H01L33/12;H01L33/32 主分类号 H01L21/20
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