发明名称 |
Interconnect structures having lead-free solder bumps |
摘要 |
An integrated circuit structure includes a semiconductor substrate, and a polyimide layer over the semiconductor substrate. An under-bump-metallurgy (UBM) has a first portion over the polyimide layer, and a second portion level with the polyimide layer. A first solder bump and a second solder bump are formed over the polyimide layer, with a pitch between the first solder bump and the second solder bump being no more than 150μm. A width of the UBM equals one-half of the pitch plus a value greater than 5μm.
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申请公布号 |
US8169076(B2) |
申请公布日期 |
2012.05.01 |
申请号 |
US20090537001 |
申请日期 |
2009.08.06 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
LII MIRNG-JI;LEE CHIEN-HSIUN;YU CHEN-HUA;JENG SHIN-PUU;KU CHIN-YU |
分类号 |
H01L23/498 |
主分类号 |
H01L23/498 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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