发明名称 Interconnect structures having lead-free solder bumps
摘要 An integrated circuit structure includes a semiconductor substrate, and a polyimide layer over the semiconductor substrate. An under-bump-metallurgy (UBM) has a first portion over the polyimide layer, and a second portion level with the polyimide layer. A first solder bump and a second solder bump are formed over the polyimide layer, with a pitch between the first solder bump and the second solder bump being no more than 150μm. A width of the UBM equals one-half of the pitch plus a value greater than 5μm.
申请公布号 US8169076(B2) 申请公布日期 2012.05.01
申请号 US20090537001 申请日期 2009.08.06
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 LII MIRNG-JI;LEE CHIEN-HSIUN;YU CHEN-HUA;JENG SHIN-PUU;KU CHIN-YU
分类号 H01L23/498 主分类号 H01L23/498
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