| 摘要 |
A semiconductor device includes: a drift layer of a first conductivity type; a base layer of a second conductivity type provided on the drift layer; an emitter layer of the first conductivity type provided in part of an upper portion of the base layer; a buffer layer of the first conductivity type provided below the drift layer; a high-resistance layer of the first conductivity type provided below the buffer layer; a collector layer of the second conductivity type provided in a partial region on a lower surface of the high-resistance layer; a contact layer of the first conductivity type provided in another partial region on the lower surface of the high-resistance layer; a trench gate electrode extending through the emitter layer and the base layer into the drift layer; and a gate insulating film provided between the emitter layer, the base layer, and the drift layer on one hand and the trench gate electrode on the other. |
