发明名称 |
Post plasma etch/ash residue and silicon-based anti-reflective coating remover compositions containing tetrafluoroborate ion |
摘要 |
A microelectronic cleaning compositions of: a) from about 80% to about 99% by weight of the composition of at least one organic sulfone; b) from about 0.5% to about 19% by weight of the composition of water; and c) from about 0.5% to about 10% by weight of the composition of at least one component providing tetrafluoroborate ion, and d) optionally at least one polyhydric alcohol is especially useful to clean etch/ash residues from microelectronic substrates or device having both Si-based anti-reflective coatings and low-k dielectrics. |
申请公布号 |
US8168577(B2) |
申请公布日期 |
2012.05.01 |
申请号 |
US20090811257 |
申请日期 |
2009.02.05 |
申请人 |
GEMMILL WILLIAM R.;AVANTOR PERFORMANCE MATERIALS, INC. |
发明人 |
GEMMILL WILLIAM R. |
分类号 |
C11D7/50;G03F7/42 |
主分类号 |
C11D7/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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