| 摘要 |
The present invention provides a method for manufacturing an electrophotographic photosensitive member including a step of forming a first surface layer and a second surface layer of the electrophotographic photosensitive member by supplying a source gas into a reaction vessel so that C2/S2, which are respectively flow rates of CH4 and SiH4 flowing when the second surface layer is formed, can be 3 or more and 25 or less, and C1/S1, which are respectively flow rates of CH4 and SiH4 flowing when the first surface layer is formed, can be C2/S2 or more but 60 or less. The method includes an additional step of adjusting the high-frequency power so that P2>P1 can be satisfied, which are high-frequency powers respectively when the second surface layer is formed and when the first surface layer is formed, and C/(Si+C) of the first surface layer and C/(Si+C) of the second surface layer can be 0.50 or more and 0.80 or less. |
