发明名称 NITROGEN-CONTAINING ORGANIC COMPOUND, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
摘要 PURPOSE: A nitrogen-containing organic compound is provided to ensure high resolution and pattern sphericity. CONSTITUTION: A nitrogen-containing organic compound is denoted by chemical formula 1. A positive chemical amplification resist material contains nitrogen-containing organic compounds of chemical formula 1 as a quencher. The material contains nitrogen-containing organic compound, organic solvent, base resin which changes solubility of an alkali developing solution by acid; a photoacid generator, and sulfonium salt compound of chemical formula 2.
申请公布号 KR20120041114(A) 申请公布日期 2012.04.30
申请号 KR20110085254 申请日期 2011.08.25
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 SAGEHASHI MASAYOSHI;WATANABE TAKERU;KOBAYASHI TOMOHIRO
分类号 C07D235/18;C07D235/08;G03F7/004;H01L21/027 主分类号 C07D235/18
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