发明名称 |
NITROGEN-CONTAINING ORGANIC COMPOUND, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS |
摘要 |
PURPOSE: A nitrogen-containing organic compound is provided to ensure high resolution and pattern sphericity. CONSTITUTION: A nitrogen-containing organic compound is denoted by chemical formula 1. A positive chemical amplification resist material contains nitrogen-containing organic compounds of chemical formula 1 as a quencher. The material contains nitrogen-containing organic compound, organic solvent, base resin which changes solubility of an alkali developing solution by acid; a photoacid generator, and sulfonium salt compound of chemical formula 2. |
申请公布号 |
KR20120041114(A) |
申请公布日期 |
2012.04.30 |
申请号 |
KR20110085254 |
申请日期 |
2011.08.25 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
SAGEHASHI MASAYOSHI;WATANABE TAKERU;KOBAYASHI TOMOHIRO |
分类号 |
C07D235/18;C07D235/08;G03F7/004;H01L21/027 |
主分类号 |
C07D235/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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