发明名称 |
METHOD OF DEPOSITING DLC ON SUBSTRATE |
摘要 |
Durability and/or longevity of a diamond-like carbon (DLC) layer can be improved by varying the voltage and/or ion energy used to ion beam deposit the DLC layer. For example, a relatively low voltage may be used to ion beam deposit a first portion of the DLC layer on the substrate, and thereafter a second higher voltage(s) used to ion beam deposit a second higher density portion of the DLC layer over the first portion of the DLC layer. In such a manner, ion mixing at the bottom of the DLC layer can be reached, and the longevity and/or durability of the DLC improved. |
申请公布号 |
PL211099(B1) |
申请公布日期 |
2012.04.30 |
申请号 |
PL20040377259 |
申请日期 |
2004.02.04 |
申请人 |
GUARDIAN INDUSTRIES CORP. |
发明人 |
VEERASAMY VIJAYEN S.;THOMSEN SCOTT V. |
分类号 |
C03C17/22;B32B17/06;C23C14/06;C23C14/22;C23C14/46 |
主分类号 |
C03C17/22 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|